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UN-UW036022C-3MP

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Fused Silica is formed by chemical combination of silicon and oxygen. Fused Silica is perfect optical material due to its good UV and IR transmission, low coefficient of thermal expansion. It has high stability and resistance to thermal shock over large temperature excursions, wide temperature operating range and high laser damage threshold.
UN-TFA1228S-6MP
UN-TFA1228S-6MP

Product Features:


· Developed for 1/1.8" image format
· Low distortion
· High relative illumination

· Focus and iris fixed with screw


Product information: Custom designs are available upon request.

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